Advanced and affordable EUV lithography with deep-dive mitigation of ML defects

Yoshihiro Tezuka

doi:10.1117/12.2656146

15 September 2022 Advanced and affordable EUV lithography with deep-dive mitigation of ML defects

Yoshihiro Tezuka

Proceedings Volume PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology; PC123250H (2022) https://doi.org/10.1117/12.2656146
Event: Photomask Japan 2022, 2022, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 2022.

Conference Presentation

Citation Download Citation

Yoshihiro Tezuka "Advanced and affordable EUV lithography with deep-dive mitigation of ML defects", Proc. SPIE PC12325, Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology, PC123250H (15 September 2022); https://doi.org/10.1117/12.2656146

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