Comparative study of laser-assisted etching using femtosecond laser pulses emitted at IR (1030 nm) and UV (343 nm) wavelengths

Benedikt Hermann; Luca Muscarella; Yves Bellouard; Olivier Bernard

doi:10.1117/12.2648970

17 March 2023 Comparative study of laser-assisted etching using femtosecond laser pulses emitted at IR (1030 nm) and UV (343 nm) wavelengths

Benedikt Hermann, Luca Muscarella, Yves Bellouard, Olivier Bernard

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Proceedings Volume PC12411, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XXIII; PC124110G (2023) https://doi.org/10.1117/12.2648970
Event: SPIE LASE, 2023, San Francisco, California, United States

Abstract

In this contribution, we compare the etching behaviour of fused silica machined with a femtosecond laser at three different wavelengths. We use a high-power YAG laser to generate 450 fs-long pulses at the first (1030 nm) and third (343 nm) harmonic. We demonstrate how these new machining techniques can be used to improve the laser-assisted etching in fused silica not only in terms of etching speed, but also in terms of minimal feature size and surface roughness. Processing speeds of several 100 mm/s become possible due to the new regime using fs-UV light.

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Benedikt Hermann, Luca Muscarella, Yves Bellouard, and Olivier Bernard "Comparative study of laser-assisted etching using femtosecond laser pulses emitted at IR (1030 nm) and UV (343 nm) wavelengths", Proc. SPIE PC12411, Frontiers in Ultrafast Optics: Biomedical, Scientific, and Industrial Applications XXIII, PC124110G (17 March 2023); https://doi.org/10.1117/12.2648970

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KEYWORDS

Etching

Femtosecond phenomena

Ultraviolet radiation

Laser applications

Microfluidics

Molecular lasers

Optical components

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