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17 March 2023 Advancement in two-photon grayscale lithography
Michael Thiel, Andrea Bertoncini, Tobias Hoose, Matthias Blaicher
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Proceedings Volume PC12433, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI; PC124330B (2023) https://doi.org/10.1117/12.2647707
Event: SPIE OPTO, 2023, San Francisco, California, United States
Abstract
We present recent advancements in two-photon grayscale lithography (2GL®). In contrast to one-photon grayscale lithography, for 2GL®, the exposed volume pixel is strongly confined to the vicinity of the laser focus allowing for a truly 3-dimensional dose control with very high spatial resolution. Discrete and accurate steps as well as essentially continuous topographies can be printed with increased throughput, on any substrate, and without the need for additional lithography steps or mask fabrication. We update on throughput and quality levels of the method. As demonstrators we fabricate and characterize a variety of microoptics and other benchmark structures.
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Michael Thiel, Andrea Bertoncini, Tobias Hoose, and Matthias Blaicher "Advancement in two-photon grayscale lithography", Proc. SPIE PC12433, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVI, PC124330B (17 March 2023); https://doi.org/10.1117/12.2647707
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KEYWORDS
Grayscale lithography
Lithography
Mask making
Micro optics
Spatial resolution
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