Presentation
23 August 2023 On aberration retrieval for optical microscopes in length metrology
Author Affiliations +
Abstract
In this contribution, we present a technique for the determination of optical aberrations, which is based on measurements of the point spread function and a Bayesian optimization of rigorous simulations. The measuring system is a UV-microscope in a reflected light configuration with a 200x magnification, unpolarized light, and an illumination and imaging NA of 0.44 and 0.55, respectively. The PSF is measured by imaging a small quadratic chrome dot (side length ≈ 180 nm) on a glass substrate. We investigate the impact of different adjustment states, different dot locations and different optical microscopes.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan Krüger, Bernd Bodermann, Rainer Köning, Phillip Manley, Lin Zschiedrich, Philipp-Immanuel Schneider, Andreas Heinrich, Christian Eder, Ulrike Zeiser, and Aksel Goehnermeier "On aberration retrieval for optical microscopes in length metrology", Proc. SPIE PC12619, Modeling Aspects in Optical Metrology IX, PC126190A (23 August 2023); https://doi.org/10.1117/12.2672294
Advertisement
Advertisement
KEYWORDS
Imaging systems

Optical aberrations

Optical microscopes

Metrology

Point spread functions

Objectives

Polarization

RELATED CONTENT

Implementation of a Wavefront coded microscope by the use of...
Proceedings of SPIE (September 17 2018)
Longitudinal field imaging
Proceedings of SPIE (July 09 2003)
Optical Microscopic Tomography
Proceedings of SPIE (October 25 1985)
Scanned Laser Imaging For Integrated Circuit Metrology
Proceedings of SPIE (January 02 1986)

Back to Top