In-line scanning probe technologies for mask defect inspection and repair

Sang-Joon Cho

doi:10.1117/12.3012432

26 September 2023 In-line scanning probe technologies for mask defect inspection and repair

Sang-Joon Cho

Author Affiliations +

Proceedings Volume PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology; PC1291505 (2023) https://doi.org/10.1117/12.3012432
Event: Photomask Japan 2023, 2023, Online Only

Abstract

This conference presentation was prepared for Photomask Japan 2023.

Conference Presentation

Citation Download Citation

Sang-Joon Cho "In-line scanning probe technologies for mask defect inspection and repair", Proc. SPIE PC12915, Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology, PC1291505 (26 September 2023); https://doi.org/10.1117/12.3012432

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE