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19 September 2017 Lithographic Stochastics: Beyond 3σ (erratum)
Robert L. Bristol, Marie E. Krysak
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 16, Issue 3, 039801 (September 2017). https://doi.org/10.1117/1.JMM.16.3.039801
Abstract
This article corrects an error in the original publication.
© 2017 Society of Photo-Optical Instrumentation Engineers (SPIE)
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Robert L. Bristol and Marie E. Krysak "Lithographic Stochastics: Beyond 3σ (erratum)," Journal of Micro/Nanolithography, MEMS, and MOEMS 16(3), 039801 (19 September 2017). https://doi.org/10.1117/1.JMM.16.3.039801
Published: 19 September 2017
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KEYWORDS
Lithography
Stochastic processes
Microelectromechanical systems
Microopto electromechanical systems
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