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27 February 2019 Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (Erratum)
Heng Zhang, Sikun Li, Xiangzhao Wang, Chaoxing Yang, Wei Cheng
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Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 18, Issue 1, 019801 (February 2019). https://doi.org/10.1117/1.JMM.18.1.019801
Abstract
This erratum corrects mistakes in the original paper.
© 2019 Society of Photo-Optical Instrumentation Engineers (SPIE)
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Heng Zhang, Sikun Li, Xiangzhao Wang, Chaoxing Yang, and Wei Cheng "Optimization of defect compensation for extreme ultraviolet lithography mask by covariance-matrix-adaption evolution strategy (Erratum)," Journal of Micro/Nanolithography, MEMS, and MOEMS 18(1), 019801 (27 February 2019). https://doi.org/10.1117/1.JMM.18.1.019801
Published: 27 February 2019
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KEYWORDS
Photomasks
Extreme ultraviolet lithography
Lithium
EUV optics
Mechanics
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