Exposure dependence of the developed depth in nonadiabatic photolithography using visible optical near fields

Tadashi Kawazoe; Motoichi Ohtsu; Yasuhisa Inao; Ryou Kuroda

doi:10.1117/1.2833587

1 December 2007 Exposure dependence of the developed depth in nonadiabatic photolithography using visible optical near fields

Tadashi Kawazoe, Motoichi Ohtsu, Yasuhisa Inao, Ryou Kuroda

Author Affiliations +

Journal of Nanophotonics, Vol. 1, Issue 1, 011595 (December 2007). https://doi.org/10.1117/1.2833587

Abstract

We have developed new type of photolithography based on a nonadiabatic photochemical process that exposes an ultraviolet-photoresist using a visible optical near field. Investigating the exposure dependence of the developed depth using nonadiabatic photolithography, we found that the depth increased with the exposure threshold. To explain this result, the optical field intensity was simulated by using the finite-difference time-domain method. The evolution of the developed depth was proportional to the optical field intensity and its spatial gradient, agreeing closely with the simulated result that took into account the nonadiabatic processes. Another experimental result is to support our explanation, that in nonadiabatic photolithography, a component of the exposure progresses inside the photoresist.

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Tadashi Kawazoe, Motoichi Ohtsu, Yasuhisa Inao, and Ryou Kuroda "Exposure dependence of the developed depth in nonadiabatic photolithography using visible optical near fields," Journal of Nanophotonics 1(1), 011595 (1 December 2007). https://doi.org/10.1117/1.2833587

Published: 1 December 2007

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