Dr. Allen Carroll Profile

Dr. Allen Carroll

Principal Engineer at PDF Solutions Inc

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Publications (10)

Proceedings Article | 28 March 2014 Paper

The REBL DPG: recent innovations and remaining challenges

Allen Carroll, Luca Grella, Kirk Murray, Mark McCord, Paul Petric, William Tong, Christopher Bevis, Shy-Jay Lin, Tsung-Hsin Yu, Tze-Chiang Huang, T. Wang, Wen-Chuan Wang, J. Shin

Proceedings Volume 9049, 904917 (2014) https://doi.org/10.1117/12.2048528

KEYWORDS: Mirrors, Lithography, Semiconducting wafers, Error control coding, Reflectivity, Switching, Electrodes, Data compression, Printing, Electron beam lithography

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Proceedings Article | 28 March 2014 Paper

REBL DPG lenslet structure: design for charging prevention

Shy-Jay Lin, T. Bao, C. Lu, S.-C. Wang, T. C. Chien, J.-J. Shin, Burn Lin, Mark McCord, Alan Brodie, Allen Carroll, Luca Grella

Proceedings Volume 9049, 90491X (2014) https://doi.org/10.1117/12.2045416

KEYWORDS: Dielectrics, Electrodes, Electron beam lithography, Microelectromechanical systems, Atomic layer deposition, Lens design, Structural design, Coating, Reflectivity, Electron beams

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SPIE Journal Paper | 5 August 2013 Open Access

Digital pattern generator: an electron-optical MEMS for massively parallel reflective electron beam lithography

Luca Grella, Allen Carroll, Kirk Murray, Mark McCord, William Tong, Alan Brodie, Thomas Gubiotti, Fuge Sun, Francoise Kidwingira, Shinichi Kojima, Paul Petric, Christopher Bevis, Bart Vereecke, Luc Haspeslagh, Anil Mane, Jeffrey Elam

JM3, Vol. 12, Issue 03, 031107, (August 2013) https://doi.org/10.1117/12.10.1117/1.JMM.12.3.031107

KEYWORDS: Electrodes, Mirrors, Microelectromechanical systems, Semiconducting wafers, Tin, Electron beam lithography, Metals, Aluminum, Coating, Reflectivity

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Proceedings Article | 26 March 2013 Paper

Reflective electron beam lithography: lithography results using CMOS controlled digital pattern generator chip

Thomas Gubiotti, Jeff Fuge Sun, Regina Freed, Francoise Kidwingira, Jason Yang, Chris Bevis, Allen Carroll, Alan Brodie, William Tong, Shy-Jay Lin, Wen-Chuan Wang, Luc Haspeslagh, Bart Vereecke

Proceedings Volume 8680, 86800H (2013) https://doi.org/10.1117/12.2010722

KEYWORDS: Semiconducting wafers, Electron beam lithography, Lithography, Coating, Logic, Electron beams, Polymethylmethacrylate, Printing, Reflectivity, Silica

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Maskless electron beam lithography can potentially extend semiconductor manufacturing to the 10 nm logic (16 nm half pitch) technology node and beyond. KLA-Tencor is developing Reflective Electron Beam Lithography (REBL) technology targeting high-volume 10 nm logic node performance. REBL uses a novel multi-column wafer writing system combined with an advanced stage architecture to enable the throughput and resolution required for a NGL system. Using a CMOS Digital Pattern Generator (DPG) chip with over one million microlenses, the system is capable of maskless printing of arbitrary patterns with pixel redundancy and pixel-by-pixel grayscaling at the wafer. Electrons are generated in a flood beam via a thermionic cathode at 50-100 keV and decelerated to illuminate the DPG chip. The DPG-modulated electron beam is then reaccelerated and demagnified 80-100x onto the wafer to be printed. Previously, KLA-Tencor reported on the development progress of the REBL tool for maskless lithography at and below the 10 nm logic technology node. Since that time, the REBL team has made good progress towards developing the REBL system and DPG for direct write lithography. REBL has been successful in manufacturing a CMOS controlled DPG chip with a stable charge drain coating and with all segments functioning. This DPG chip consists of an array of over one million electrostatic lenslets that can be switched on or off via CMOS voltages to pattern the flood electron beam. Testing has proven the validity of the design with regards to lenslet performance, contrast, lifetime, and pattern scrolling. This chip has been used in the REBL demonstration platform system for lithography on a moving stage in both PMMA and chemically amplified resist. Direct imaging of the aerial image has also been performed by magnifying the pattern at the wafer plane via a mag stack onto a YAG imaging screen. This paper will discuss the chip design improvements and new charge drain coating that have resulted in a functional DPG chip and will evaluate the current chip performance on the REBL system. Print results for line/space and device test patterns at the 100nm node will be presented.

Proceedings Article | 8 November 2012 Paper

Reflective electron-beam lithography performance for the 10nm logic node

Regina Freed, Thomas Gubiotti, Jeff Sun, Anthony Cheung, Jason Yang, Mark McCord, Paul Petric, Allen Carroll, Upendra Ummethala, Layton Hale, John Hench, Shinichi Kojima, Walter Mieher, Chris Bevis

Proceedings Volume 8522, 85221J (2012) https://doi.org/10.1117/12.964978

KEYWORDS: Electron beam lithography, Lithography, Semiconducting wafers, Reflectivity, Logic, YAG lasers, Direct write lithography, Wafer-level optics, Computer aided design, Electron beams

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Proceedings Article | 21 March 2012 Paper

REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography

Mark McCord, Paul Petric, Upendra Ummethala, Allen Carroll, Shinichi Kojima, Luca Grella, Sameet Shriyan, Charles Rettner, Chris Bevis

Proceedings Volume 8323, 832311 (2012) https://doi.org/10.1117/12.919744

KEYWORDS: Semiconducting wafers, Electron beam lithography, Wafer-level optics, Lithography, Metrology, Integrated optics, Electron beams, Reflectivity, Silicon, Modulation

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Proceedings Article | 4 April 2011 Paper

New advances with REBL for maskless high-throughput EBDW lithography

Paul Petric, Chris Bevis, Mark McCord, Allen Carroll, Alan Brodie, Upendra Ummethala, Luca Grella, Anthony Cheung, Regina Freed

Proceedings Volume 7970, 797018 (2011) https://doi.org/10.1117/12.882636

KEYWORDS: Semiconducting wafers, Mirrors, Reflectivity, Microelectromechanical systems, Magnetism, Photography, Electron beam lithography, Wafer-level optics, YAG lasers, Lithography

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Proceedings Article | 18 March 2009 Open Access

REBL nanowriter: Reflective Electron Beam Lithography

Paul Petric, Chris Bevis, Alan Brodie, Allen Carroll, Anthony Cheung, Luca Grella, Mark McCord, Henry Percy, Keith Standiford, Marek Zywno

Proceedings Volume 7271, 727107 (2009) https://doi.org/10.1117/12.817319

KEYWORDS: Semiconducting wafers, Electron beam lithography, Lithography, Electron beams, Reflectivity, Wafer-level optics, Prisms, Calibration, Electrodes, Mirrors

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Proceedings Article | 27 December 2002 Paper

Laser PG performance for 100-nm photomasks

Mats Rosling, Andrzej Karawajczyk, Per Askebjer, Raoul Zerne, Allen Carroll, Robert Eklund, Hans Fosshaug, Torbjoern Sandstrom

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468622

KEYWORDS: Spatial light modulators, Photomasks, Critical dimension metrology, Micromirrors, Analog electronics, Deep ultraviolet, Mirrors, Image resolution, Manufacturing, Electron beam lithography

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Proceedings Article | 30 July 2002 Paper

Controlling CD variations in a massively parallel pattern generator

Jarek Luberek, Allen Carroll, Torbjoern Sandstrom, Andrzej Karawajczyk

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474615

KEYWORDS: Mirrors, Spatial light modulators, Calibration, Charge-coupled devices, Spatial filters, Micromirrors, Critical dimension metrology, Imaging systems, CCD image sensors, Printing

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Showing 5 of 10 publications

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