Chrome-on-quartz optics serve multi-functions including high-resolution masks for UV lithography. At the next node down, F2-laser lithography demands alternate high-transparency substrates such as wide-bandgap CaF2. We present here a direct-write method of F2-laser ablation for selective removal of 110-nm thick chrome films on CaF2 and SiO2 (fused silica) substrates. Laser-processing parameters are presented for micropatterning of the chrome film with minimal damage to the underlying substrates. Damage thresholds, ablations rates, incubation processes, and surface morphology of the chrome and CaF2 are described together with methods that reduce ablation debris and collateral damage. Laser-patterned masks are tested in a 157-nm optical projection system at 30-mJ/cm2 fluence for sub-micron laser structuring of glass and other materials.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.