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Atsunori Terasaki
at Canon Inc
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Publications (1)
Proceedings Article | 20 March 2008 Paper
A method for fabricating below 22nm feature patterns in quartz mold
Proceedings Volume 6921, 69211N (2008) https://doi.org/10.1117/12.771561
KEYWORDS: Chromium, Etching, Photomasks, Quartz, Scanning electron microscopy, Photoresist processing, Nanoimprint lithography, Lithography, Image processing, Plasma
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