Dr. Bo Peng
at Shanghai Institute of Optics and Fine Mechanics
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 30 September 2011 Paper
Proceedings Volume 8169, 816909 (2011) https://doi.org/10.1117/12.896319
KEYWORDS: Lithography, Monochromatic aberrations, Sensors, Image sensors, Semiconducting wafers, Wavefront aberrations, Photomasks, Process modeling, Statistical analysis, Error analysis

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