Clair Webb
at Intel Corp
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2008 Paper
Proceedings Volume 6925, 692503 (2008) https://doi.org/10.1117/12.772052
KEYWORDS: Transistors, Design for manufacturing, Optical lithography, Manufacturing, Logic, Lithography, Optical proximity correction, Product engineering, Metals

Proceedings Article | 10 March 2006 Paper
Proceedings Volume 6156, 615602 (2006) https://doi.org/10.1117/12.664598
KEYWORDS: Computer aided design, Optical proximity correction, Lithography, Metals, Transistors, Resolution enhancement technologies, 193nm lithography, Signal processing, Extreme ultraviolet, Logic

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