Mr. Dongmin Jeong Profile

Dongmin Jeong

Graduate Student at Hanyang Univ

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Author

Publications (5)

Proceedings Article | 10 April 2024 Presentation + Paper

EUV reflectometry and scatterometry for thin layer and periodic structure characterization

Tao Shen, Iacopo Mochi, Paolo Ansuinelli, Dongmin Jeong, Jinho Ahn, Yasin Ekinci

Proceedings Volume 12955, 129550D (2024) https://doi.org/10.1117/12.3010875

KEYWORDS: Extreme ultraviolet, Reflectometry, Scatterometry, Grazing incidence, Diffraction, Diffraction gratings, Reflectivity, Overlay metrology

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Proceedings Article | 21 November 2023 Poster + Paper

Platinum-based alloy absorber with improved etching properties for next-generation EUV mask

Yunsoo Kim, Dongmin Jeong, Seungho Lee, Jinho Ahn

Proceedings Volume 12750, 127500R (2023) https://doi.org/10.1117/12.2685114

KEYWORDS: Etching, Alloys, Thin films, Extreme ultraviolet, Platinum, Optical properties, Ion implantation, 3D mask effects, Ions, Tungsten

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Proceedings Article | 31 October 2022 Poster

Alternative EUV mask with platinum-tungsten alloy for high-NA EUV lithography

Yunsoo Kim, Dongmin Jeong, Minsun Cho, Jinho Ahn

Proceedings Volume PC12292, PC122920U (2022) https://doi.org/10.1117/12.2641805

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Platinum, Etching, Tungsten, Refractive index, 3D image processing, Thin films, Phase shifts

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Proceedings Article | 13 June 2022 Poster

Effect of diffraction phase control for EUV phase shift mask

Dongmin Jeong, Deukgyu Kim, Yunsoo Kim, Minsun Cho, Jinho Ahn

Proceedings Volume PC12051, PC120510V (2022) https://doi.org/10.1117/12.2614362

KEYWORDS: Diffraction, Extreme ultraviolet, Phase shifts

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Proceedings Article | 22 February 2021 Poster + Presentation

Fabrication and evaluation of nickel-based high-k mask for high numerical aperture extreme ultraviolet lithography

Dongmin Jeong, Yoon Jong Han, Deuk Gyu Kim, Yunsoo Kim, Jinho Ahn

Proceedings Volume 11609, 116091U (2021) https://doi.org/10.1117/12.2586778

KEYWORDS: Extreme ultraviolet lithography, Photomasks, Nickel, Mass attenuation coefficient, Dry etching, Nanoimprint lithography, High volume manufacturing, Extreme ultraviolet, Crystals

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