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Dr. Douglas Holmgren
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Publications (1)
Proceedings Article | 15 October 2003 Paper
A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode
Juan Maldonado, Steven Coyle, Bassam Shamoun, Ming Yu, Timothy Thomas, Douglas Holmgren, Xiaolan Chen, B. DeVore, M. Scheinfein, Mark Gesley
Proceedings Volume 5220, (2003) https://doi.org/10.1117/12.512863
KEYWORDS: Photomasks, Lithography, Raster graphics, Electron beam lithography, Mask making, Modulation, Prototyping, Electron beams, Semiconducting wafers, Laser applications
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