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Farrell A. Small
Manager/Mechanical Engineering at Brijot Imaging Systems Inc
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Publications (1)
Proceedings Article | 20 October 2006 Paper
Advanced femtosecond DUV laser mask repair tool for large area photomasks
Leon Treyger, Jon Heyl, Michael Fink, Iztok Koren, Yonggang Li, Donald Ronning, Farrell Small, Bin Xian
Proceedings Volume 6349, 63494G (2006) https://doi.org/10.1117/12.686505
KEYWORDS: Photomasks, Chemical vapor deposition, Femtosecond phenomena, Deep ultraviolet, Laser ablation, Metals, Glasses, Objectives, Computer programming, Laser development
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