Dr. George Vakanas Profile

Dr. George Vakanas

SiPh/SiP Tech. Prog. Mgr (TPM) at Intel Corp

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Proceedings Article | 28 May 2004 Paper

Lithography-based automation in the design of program defect masks

George Vakanas, Saghir Munir, Edita Tejnil, Daniel Bald, Rajesh Nagpal

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.544536

KEYWORDS: Computer aided design, Photomasks, Inspection, Optical proximity correction, SRAF, Binary data, Image processing, Model-based design, Defect inspection, Resolution enhancement technologies

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In this work, we are reporting on a lithography-based methodology and automation in the design of Program Defect masks (PDM’s). Leading edge technology masks have ever-shrinking primary features and more pronounced model-based secondary features such as optical proximity corrections (OPC), sub-resolution assist features (SRAF’s) and phase-shifted mask (PSM) structures. In order to define defect disposition specifications for critical layers of a technology node, experience alone in deciding worst-case scenarios for the placement of program defects is necessary but may not be sufficient. MEEF calculations initiated from layout pattern data and their integration in a PDM layout flow provide a natural approach for improvements, relevance and accuracy in the placement of programmed defects. This methodology provides closed-loop feedback between layout and hard defect disposition specifications, thereby minimizing engineering test restarts, improving quality and reducing cost of high-end masks. Apart from SEMI and industry standards, best-known methods (BKM’s) in integrated lithographically-based layout methodologies and automation specific to PDM’s are scarce. The contribution of this paper lies in the implementation of Design-For-Test (DFT) principles to a synergistic interaction of CAD Layout and Aerial Image Simulator to drive layout improvements, highlight layout-to-fracture interactions and output accurate program defect placement coordinates to be used by tools in the mask shop.

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