Prof. Han Haitjema
Professor at KU Leuven
SPIE Involvement:
Author | Instructor
Area of Expertise:
Metrology , Interferometry
Publications (15)

Proceedings Article | 4 October 2023 Presentation + Paper
Proceedings Volume 12672, 1267203 (2023) https://doi.org/10.1117/12.2675503
KEYWORDS: Standards development, Equipment, Calibration, Tunable filters, Metrology, Optical surfaces, Optical metrology, Measurement uncertainty, Time metrology, Manufacturing

Proceedings Article | 18 August 2005 Paper
H. Haitjema, M. Morel
Proceedings Volume 5879, 58790I (2005) https://doi.org/10.1117/12.614858
KEYWORDS: Calibration, Denoising, Interferometers, Radium, Optical filters, Ranging, Interferometry, Gaussian filters, Safety, Linear filtering

Proceedings Article | 18 August 2005 Paper
Jorrit Thijsse, Asa Jamting, Nick Brown, Han Haitjema
Proceedings Volume 5879, 58790M (2005) https://doi.org/10.1117/12.625469
KEYWORDS: Interferometers, Beam splitters, Receivers, Heterodyning, Optical testing, Polarization, Transmittance, Aluminum, Signal detection, Lasers

SPIE Journal Paper | 1 February 2005
Bastiaan Knarren, Suzanne Cosijns, Han Haitjema, Piet Schellekens
OE, Vol. 44, Issue 02, 025003, (February 2005) https://doi.org/10.1117/12.10.1117/1.1839229
KEYWORDS: Polarization, Connectors, Interferometers, Fiber characterization, Polarizers, Heterodyning, Wave plates, Optical engineering, Data modeling, Phase modulation

SPIE Journal Paper | 1 February 2005
Bastiaan Knarren, Suzanne Cosijns, Han Haitjema, Piet Schellekens
OE, Vol. 44, Issue 02, 025002, (February 2005) https://doi.org/10.1117/12.10.1117/1.1839228
KEYWORDS: Polarization, Polarizers, Interferometers, Phase modulation, Heterodyning, Fiber characterization, Connectors, Fiber lasers, Optical fibers, Lasers

Showing 5 of 15 publications
Conference Committee Involvement (2)
Recent Developments in Traceable Dimensional Measurements III
31 July 2005 | San Diego, California, United States
Recent Developments in Traceable Dimensional Measurements II
4 August 2003 | San Diego, California, United States
Course Instructor
SC562: Accuracy of Interferometric Measurements for Nano-Metrology
This course gives the attendees insight into the physical principles that enable and limit the possibilities of metrology at the nm-uncertainty level. An overview will be given of measurement techniques and principles that are available, with emphasis on their suitability for accurate measurements. Special attention will be given to laser-interferometry. This technique for measuring displacements can be used in several ways as part of a nanometer measuring- or manufacturing device. Another important measuring technique is the measurement of flatness and form deviations by Fizeau or similar interferometers. It will be demonstrated where the limits are and how these can be established for this technique. Examples will be given in the measurement of nanostructures.
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