Dr. Harsha Grunes Profile

Dr. Harsha Grunes

Senior Principal Engineer at Intel Corp.

SPIE Involvement:

Conference Co-Chair | Editor | Author

Area of Expertise:

Photolithography , RET - Resolution Enhancement Techniques , OPC - Optical Proximity Correction , Photomasks

Publications (1)

Proceedings Article | 30 April 2023 Presentation

A CD uniformity study comparing MRC-constrained all-angle to Manhattan OPC corrections on EUV

Ryan Pearman, Ragu Venkatesan, Arvind Sundaramurthy, Patrick Straney, Zach Rice, Rusty Conner, Harsha Grunes

Proceedings Volume 12495, 124950F (2023) https://doi.org/10.1117/12.2662761

KEYWORDS: Photomasks, Optical proximity correction, Extreme ultraviolet, Optics manufacturing, High volume manufacturing, Extreme ultraviolet lithography

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Proceedings Volume Editor (1)

SPIE Conference Volume | 25 April 2024

DTCO and Computational Patterning III

Conference Committee Involvement (10)

DTCO and Computational Patterning IV

23 February 2025 | San Jose, California, United States

DTCO and Computational Patterning III

26 February 2024 | San Jose, California, United States

DTCO and Computational Patterning II

27 February 2023 | San Jose, California, United States

DTCO and Computational Patterning

26 April 2022 | San Jose, California, United States

Optical Lithography XXXIV

22 February 2021 | Online Only, California, United States

Showing 5 of 10 Conference Committees

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