Dr. Helene Maury Profile

Dr. Helene Maury

at Commissariat à l'Énergie Atomique

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Proceedings Article | 24 August 2009 Paper

High resolution x-ray imaging microscope for diagnostics of inertial confinement fusion

Helene Maury, Philippe Troussel, J. Champeaux

Proceedings Volume 7430, 74300Q (2009) https://doi.org/10.1117/12.829751

KEYWORDS: Mirrors, Microscopes, Reflectivity, X-ray imaging, X-rays, Image resolution, Multilayers, Spatial resolution, Diagnostics, Grazing incidence

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X-ray imaging technology is highly developed to meet the needs of high-energy physics and diagnostics of inertial confinement fusion. In this paper, we describe the design of a non coplanar toroïdal mirrors microscope. It consists of three off-axis revolution concave toroïdal mirrors working at grazing incidence. Non-periodic W/SiC multilayer coatings have been deposited on each mirror, in order to increase until 10 keV the bandpass of reflectivity of the microscope. These super mirrors have been designed to work at 0.6° grazing incidence angle and display a reflectivity better than 40% in the entire energy range 2-10 keV. Concerning the imaging performances, we have almost achieved 5 μm of spatial resolution in a field of 500 μm. Regarding to these results, this prototype of microscope, the so-called "Plasma Imageur X pour les Experiences Laser Mega Joule" (PIXEL), will be used for 2D spatial and 1D time resolved imaging of dense plasmas produced during inertial confinement fusion experiments at the future Laser Mega Joule French facility (LMJ).

Proceedings Article | 30 April 2009 Paper

Formation of silicides in annealed periodic multilayers

H. Maury, P. Jonnard, K. Le Guen, J.-M. André

Proceedings Volume 7360, 73600P (2009) https://doi.org/10.1117/12.820915

KEYWORDS: Silicon, Annealing, Reflectivity, Magnesium, X-rays, Silicon carbide, Multilayers, Chemical species, Interfaces, Amorphous silicon

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Periodic multilayers of nanometric period are widely used as optical components for the X-ray and extreme UV (EUV) ranges, in X-ray space telescopes, X-ray microscopes, EUV photolithography or synchrotron beamlines for example. Their optical performances depend on the quality of the interfaces between the various layers: chemical interdiffusion or mechanical roughness shifts the application wavelength and can drastically decrease the reflectance. Since under high thermal charge interdiffusion is known to get enhanced, the study of the thermal stability of such structures is essential to understand how interfacial compounds develop. We have characterized X-ray and EUV siliconcontaining multilayers (Mo/Si, Sc/Si and Mg/SiC) as a function of the annealing temperature (up to 600°C) using two non-destructive methods. X-ray emission from the silicon atoms, describing the Si valence states, is used to determine the chemical nature of the compounds present in the interphases while X-ray reflectivity in the hard and soft X-ray ranges can be related to the optical properties. In the three cases, interfacial metallic (Mo, Sc, Mg) silicides are evidenced and the thickness of the interphase increases with the annealing temperature. For Mo/Si and Sc/Si multilayers, silicides are even present in the as-prepared multilayers. Characteristic parameters of the stacks are determined: composition of the interphases, thickness and roughness of the layers and interphases if any. Finally, we have evidenced the maximum temperature of application of these multilayers to minimize interdiffusion.

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