Dr. Helmut Schift
Head polymer nanotechnology group at Paul Scherrer Institut
SPIE Involvement:
Author
Area of Expertise:
nanoimprint lithography , mold fabrication , roll embossing , 3D lithography , injection molding
Profile Summary

Helmut Schift is head of the Polymer Nanotechnology Group in the Laboratory for Micro- and Nanotechnology at the Paul Scherrer Institut. He received his diploma in Electrical Engineering from the University of Karlsruhe, and performed his PhD studies at the Institute of Microtechnology Mainz. After his graduation in 1994, he joined PSI as a research staff member. His current research interests include innovative 3-D stamp fabrication and nanomolding processes, including roll embossing and injection molding.
Publications (14)

SPIE Journal Paper | 6 January 2018
Robert Kirchner, Nachiappan Chidambaram, Helmut Schift
OE, Vol. 57, Issue 04, 041403, (January 2018) https://doi.org/10.1117/12.10.1117/1.OE.57.4.041403
KEYWORDS: Vacuum ultraviolet, Polymethylmethacrylate, Polymers, Surface roughness, Surface finishing, Micro optics, Lenses, Glasses, Two photon polymerization, Polymerization

Proceedings Article | 2 January 2018 Paper
Helmut Schift, Robert Kirchner, Nachiappan Chidambaram, Mirco Altana
Proceedings Volume 10456, 104561Z (2018) https://doi.org/10.1117/12.2283236
KEYWORDS: Lenses, Polymers, Surface roughness, Lithography, Polymethylmethacrylate, Surface finishing, Two photon polymerization, Microlens array, Microlens, Electron beam lithography

Proceedings Article | 28 September 2017 Paper
R. Kirchner, R. Hoekstra, N. Chidambaram, H. Schift
Proceedings Volume 10446, 1044613 (2017) https://doi.org/10.1117/12.2279712
KEYWORDS: Micro optics, Polymers, Ultraviolet radiation, Surface finishing, Polymethylmethacrylate, Lithography, Microlens, 3D microstructuring

Proceedings Article | 21 March 2017 Presentation + Paper
Helmut Schift, Nachiappan Chidambaram, Mirco Altana, Robert Kirchner
Proceedings Volume 10144, 101440B (2017) https://doi.org/10.1117/12.2256358
KEYWORDS: Lenses, Optical testing, Polymethylmethacrylate, Lithography, Surface roughness, Vacuum ultraviolet, Polymers, Microlens, Ultraviolet radiation, Glasses, Prisms, Scanning electron microscopy, Surface finishing, Absorption

Proceedings Article | 24 February 2017 Presentation + Paper
Robert Kirchner, Nachiappan Chidambaram, Mirco Altana, Helmut Schift
Proceedings Volume 10095, 1009507 (2017) https://doi.org/10.1117/12.2258090
KEYWORDS: Lenses, Polymethylmethacrylate, Polymers, Microlens, Nanoimprint lithography, Lithography, Microlens array, Two photon polymerization, Glasses, Electron beam lithography, Surface roughness, Micro optics, Manufacturing, Surface finishing, Vacuum ultraviolet

Showing 5 of 14 publications
Conference Committee Involvement (6)
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2019
25 February 2019 | San Jose, California, United States
Novel Patterning Technologies 2018
26 February 2018 | San Jose, California, United States
Emerging Patterning Technologies 2017
27 February 2017 | San Jose, California, United States
Alternative Lithographic Technologies VIII
22 February 2016 | San Jose, California, United States
Alternative Lithographic Technologies VII
23 February 2015 | San Jose, California, United States
Showing 5 of 6 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top