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Hirohisa Okushima
at Hitachi High-Tech Corp
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Publications (1)
Proceedings Article | 24 March 2006 Paper
ArF photo resist pattern sample preparation method using FIB without protective coating
Hirohisa Okushima, Toshihiko Onozuka, Yasushi Kuroda, Toshie Yaguchi, Kaoru Umemura, Ryuichiro Tamochi, Kenji Watanabe, Norio Hasegawa, Isao Kawata, Bart Rijpers
Proceedings Volume 6152, 615244 (2006) https://doi.org/10.1117/12.655984
KEYWORDS: Silicon, Scanning transmission electron microscopy, Ion beams, Critical dimension metrology, Scanning electron microscopy, Coating, Gallium, Semiconducting wafers, Ions, Photoresist processing
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