CONFERENCE PROCEEDINGS
Advanced Search
Hironori Sasaki
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 9 November 2005 Paper
Noble development system to achieve defect-free process for 65nm node photomasks
Hironori Sasaki, Shuichi Sanki, Ryugo Hikichi, Kiyoshi Ogawa, Akihiko Naito, Yukihiro Sato, Yasuyuki Kushida, Naoyuki Ishiwata, Hiroshi Maruyama
Proceedings Volume 5992, 59920M (2005) https://doi.org/10.1117/12.633668
KEYWORDS: Opacity, Photomasks, Photoresist processing, Inspection, Defect inspection, Dry etching, Semiconductors, Manufacturing, Scanning electron microscopy, Lithography
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top