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Dr. Huiying Liu
at DuPont Electronics & Industrial
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Publications (1)
Proceedings Article | 23 March 2020 Presentation + Paper
Challenges and opportunities of KrF photoresist development for 3D NAND application
Yang Song, Mingqi Li, Jong Park, Xisen Hou, Yusuke Matsuda, Cong Liu, Emad Aqad, Janet Wu, Huan He, Huiying Liu, Paul Baranowski, Cheng Bai Xu
Proceedings Volume 11326, 113260N (2020) https://doi.org/10.1117/12.2552140
KEYWORDS: Photoresist materials, Polymers, Absorbance, Coating, Photoresist developing, 3D applications, Transparency, Transmittance, Molecules, Lithography
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