Color centers in nanodiamonds are promising candidates to realize high-bandwidth quantum optical devices integrated on mature photonic platforms. However, both the optical properties of these emitters and the geometries of host nanoparticles are highly heterogenous. The interfacing of nanodiamond-based color centers with the on-chip photonic circuitry requires their careful pre-selection and deterministic manipulation with nanoscale precision. We present a suite of recently developed techniques for rapid emitter selection and nanofabrication aimed at realizing deterministically assembled plasmon-enhanced single-photon sources. These techniques include optical nanoparticle metrology, machine learning for quantum optical measurements, probe-assisted nanoantenna assembly and the control of plasmonic cavity volume through photomodification.
Nearly all existing applications of quantum photonics require strings of single indistinguishable photons produced at high rates. Plasmonic nanostructures allow a targeted and strong enhancement of light-matter interaction in a broad wavelength range, boosting single-photon emission rates from solid-state quantum defects beyond both the rate of dipole dephasing and that of plasmon absorption in metals. We establish simple and intuitive fundamental enhancement limits for plasmonic systems coupled to quantum emitters and present practical methods for achieving these advantageous regimes. We also discuss methods for the on-chip integration of such single-photon sources and related opportunities for the readout of solid-state spins.
Low-loss plasmonic materials offer unique opportunities for quantum information applications. A strongly targeted enhancement of light-matter interaction can be used to speed up spontaneous emission of single photons by solid-state defects by several orders of magnitude, even at room temperature. We have developed several methods for the on-chip integration of such plasmon-enhanced single-photon sources. We also present some applications of plasmonic materials for the active control of solid-state spins. In the future, integrated plasmon-enhanced devices can be used as a platform for cryogen-free high-speed integrated quantum photonics.
Metal-based nanostructures made from low-loss plasmonic materials allow a targeted and strong enhancement of light-matter interaction in a broad wavelength range. As a result, the far-field single-photon emission rates from solid-state quantum defects can overcome both the rate of dipole dephasing and that of plasmon absorption in metals. This approach promises the advent of single-photon sources featuring bitrates up to the THz range and operating at cryogen-free temperatures. We establish simple and intuitive fundamental enhancement limits for plasmonic systems coupled to quantum emitters and present practical methods for achieving these advantageous regimes.
Alexander Baburin, Anton Ivanov, Igor Trofimov, Alina Dobronosovaa, Pavel Melentiev, Victor Balykin, Dmitriy Moskalev, Anastasiya Pishchimova, Liutsiia Ganieva, Ilya Ryzhikov, Ilya Rodionov
A fundamental problem in the integration of photonic elements is the problem of the light localization and the creation of nanolocalized laser sources of radiation. A new approach in the miniaturization of lasers is the approach based on using plasmon fields instead of photon fields. Plasmons arise from the interaction of the oscillations of the electron density and the electromagnetic fields that excite them. Accordingly, the electromagnetic effects caused by these fields occur in the subwavelength region near the surfaces, namely, in the nanometer range. Therefore, the approach allows to overcome the diffraction limitation on the laser size. Plasmonic nanolaser is a nanoscale (at least in one dimension) quantum generator of nanolocalized coherent plasmon fields. The nanoscopic in all three dimensions plasmon nanolaser has a different name: SPASER (Surface Plasmon Amplification by Stimulated Emission of Radiation). It is based on patterned metal film. The precision of formed structures and the dielectric properties of the metal are critical factors in determining any plasmonic device performance. Surface and morphology inhomogeneities should be minimized to avoid SPP scattering during propagation and etching anisotropy. Moreover, the metal should have high conductivity and low optical absorption to enhance optical properties and reduce losses. Some researchers focused on developing new low-loss materials (nitrides, highly-doped semiconductors, semiconductors oxides, or two-dimensional materials), but silver and gold are the most commonly used materials in optics and plasmonics due the lowest optical losses in visible and near infrared wavelength range. Recently, we have presented plasmonic nanolaser built on ultra-smooth silver films. Nanoscale structure in metallic films are typically fabricated by a two-step process. Metals are first deposited using evaporation or sputtering on a substrate and then patterned with focused-ion-beam milling or e-beam lithography and dry etching. If the deposited films are polycrystalline, etch rates vary for different grain orientations and grain boundaries. Therefore, the patterned structures could differ from each other. One of the possible solutions is to deposit singlecrystalline metals, which will be etched more uniformly and lead to precise structures. Another approach deals with large grain (<300 nm) polycrystalline film preparation. The fabricated silver films showed ultra-low losses (40 cm−1). Built on it a plasmonic laser demonstrated the lasing at 628 nm with a linewidth of 1.7 nm and a directivity of 1.3.
Colloidal suspensions and tunable self-assembly of colloidal particles attract a great interest in recent years. In this paper, we propose a new setup and technology for studies of self-assembly of colloidal particles, interection of which between themselves is tuned by external rotating electric fields. We reveal wide prospectives of electric field employment for tunable self-assembly, from suspensions of inorganic particles to ensembles of biological cells. These results make enable particle-resolved studies of various collective phenomena and fundamental processes in many-particle systems in equilibrium state and far from it, while the dynamics can be resolved at the level of individual particles using video microscopy. For the first time, we demonstrate that, apart from ability to prepare photonic crystalline films of inorganic silica particles, the tunable self-assembly provides a novel technological way for manipulation with ensembles of biological cells by control of interactions between them.
Optical properties of two-dimensional periodic systems of the dielectric micro bars and micro cones are investigated. Computer simulations as well as real experiment reveal anomalous optical response of the dielectric metasurface due to excitation of the dielectric and metal-dielectric resonances, which are excited in-between metal nanoparticles and dielectric cones and bars. In the metal-dielectric resonance local electric field can be orders on magnitude larger than the field in the plasmon resonance only. To investigate local electric field the signal molecules were deposited on the metal nanoparticles. We demonstrate the enhancement of the electro- magnetic field by detecting the Raman signal from the of organic acid molecules deposited on the investigated metasurface.
During last 20 years, great results in metamaterials and plasmonic nanostructures fabrication were obtained. However,
large ohmic losses in metals and mass production compatibility still represent the most serious challenge that obstruct
progress in the fields of metamaterials and plasmonics. Many recent research are primarily focused on developing
low-loss alternative materials, such as nitrides, II–VI semiconductor oxides, high-doped semiconductors, or
two-dimensional materials. In this work, we demonstrate that our perfectly fabricated silver films can be an effective
low-loss material system, as theoretically well-known. We present a fabrication technology of plasmonic and
metamaterial nanodevices on transparent (quartz, mica) and non-transparent (silicon) substrates by means of e-beam
lithography and ICP dry etch instead of a commonly-used focused ion beam (FIB) technology. We eliminate negative
influence of litho-etch steps on silver films quality and fabricate square millimeter area devices with different topologies
and perfect sub-100 nm dimensions reproducibility. Our silver non-damage fabrication scheme is tested on trial
manufacture of spasers, plasmonic sensors and waveguides, metasurfaces, etc. These results can be used as a flexible
device manufacture platform for a broad range of practical applications in optoelectronics, communications,
photovoltaics and biotechnology.
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