Ms. Irina Pundaleva Profile

Irina Pundaleva

Engineer at SAMSUNG Electronics Co Ltd

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Author

Publications (6)

Proceedings Article | 7 March 2008 Paper

Rigorous modeling and analysis of impact produced by microstructures in mask on wafer pattern fidelity

Irina Pundaleva, Roman Chalykh, MyoungSoo Lee, HeeBom Kim, ByungGook Kim, HanKu Cho

Proceedings Volume 6924, 69244H (2008) https://doi.org/10.1117/12.773203

KEYWORDS: Photomasks, Semiconducting wafers, Diffraction, Quartz, Distortion, Transmittance, Femtosecond phenomena, Refractive index, Binary data, Pulsed laser operation

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Proceedings Article | 12 May 2007 Paper

Scatterometry based profile metrology of two-dimensional patterns of EUV masks

Irina Pundaleva, Roman Chalykh, Heebom Kim, Byunggook Kim, Hanku Cho

Proceedings Volume 6607, 66070S (2007) https://doi.org/10.1117/12.728942

KEYWORDS: Scatterometry, 3D metrology, Extreme ultraviolet, Photomasks, Diffraction, Scatter measurement, Polarization, Metrology, Extreme ultraviolet lithography, Shape analysis

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Proceedings Article | 5 April 2007 Paper

Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes

Irina Pundaleva, Roman Chalykh, JeungWoo Lee, SeongWoon Choi, Woosung Han

Proceedings Volume 6518, 65180V (2007) https://doi.org/10.1117/12.711233

KEYWORDS: Critical dimension metrology, Scatterometry, Scatter measurement, Precision measurement, Polarization, Cadmium, Finite-difference time-domain method, Photomasks, Process control, Diffraction

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Proceedings Article | 5 April 2007 Paper

Image analysis of alignment and overlay marks with compound structure

Roman Chalykh, Irina Pundaleva, Jang-Ho Shin, Seong-Sue Kim, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6518, 65182D (2007) https://doi.org/10.1117/12.711277

KEYWORDS: Overlay metrology, Optical alignment, Antireflective coatings, Image analysis, Coating, Semiconductors, Image quality, Finite-difference time-domain method, Optical lithography, Semiconducting wafers

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Proceedings Article | 20 October 2006 Paper

Simulation of critical dimension and profile metrology based on scatterometry method

Roman Chalykh, Irina Pundaleva, SeongSue Kim, Han-Ku Cho, Joo-Tae Moon

Proceedings Volume 6349, 63491K (2006) https://doi.org/10.1117/12.688623

KEYWORDS: Critical dimension metrology, Scatterometry, Polarization, Diffraction, Diffraction gratings, Metrology, Scatter measurement, Overlay metrology, Magnetism, Light scattering

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Proceedings Article | 24 March 2006 Paper

Improved scatterometry method of critical dimension measurements and its application for control of development process

Irina Pundaleva, Dongseok Nam, Hakseung Han, Donggun Lee, Woosung Han

Proceedings Volume 6152, 61520G (2006) https://doi.org/10.1117/12.657324

KEYWORDS: Critical dimension metrology, Scatterometry, Spectroscopy, Process control, Diffraction, Diffraction gratings, Sensors, In situ metrology, Time metrology, Photomasks

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Showing 5 of 6 publications

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