Jennifer Shumway
Senior Design Engineer at ASML Netherlands BV
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 20 March 2020 Paper
Proceedings Volume 11325, 1132521 (2020) https://doi.org/10.1117/12.2552930
KEYWORDS: Semiconducting wafers, Metrology, Scanners, Immersion lithography, Critical dimension metrology, Lithography, Lithographic process control

Proceedings Article | 22 January 2018 Presentation + Paper
Jennifer Shumway, Nathan Neal, Sheldon Meyers, Jens Reichelt, Young Ki Kim, Justin Hanson, Ferhad Kamalizadeh, Dionysios Petromanolakis, Youri van Dommelen, Robert Bonanni, Arjan Gijsbertsen
Proceedings Volume 10147, 101470B (2018) https://doi.org/10.1117/12.2258391
KEYWORDS: Optical lithography, Current controlled current source, Calibration, Scanners, Reticles, Monochromatic aberrations, Software development, Semiconducting wafers

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