Mr. Jianfeng Liu Profile

Jianfeng Liu

at Huazhong Univ of Science and Technology

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Proceedings Article | 8 December 2011 Paper

Design and fabrication of diffraction imaging elements for common Gaussian laser beam in terahertz frequency

Jianfeng Liu, Jinhui Gong, Kan Liu, Xinyu Zhang, Changsheng Xie

Proceedings Volume 8002, 80020J (2011) https://doi.org/10.1117/12.902016

KEYWORDS: Chemical elements, Diffraction, Silicon, Semiconducting wafers, Gaussian beams, Photomasks, Image processing, Etching, Lenses, Optical fabrication equipment

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A special software is constructed effectively for reconstructing the fine phase distribution of the diffracted Gaussian laser beams in the terahertz frequency range, according to common diffraction theory. The fine surface microrelief patterns of the elements, which originate from the simple patterns in photomask and further etched onto the surface of {100}- oriented silicon wafer by a low cost and rapid method, are created by the software above according to the phase distribution designed. Being different with the traditional silicon diffractive lenses fabricated by multiple level processes, the elements produced by the method introduced by us can transfer common Gaussian beams into desired images through created fine patterns over the surface of the elements. Two typical type of diffractive elements, which are used to transform common Gaussian laser beams in terahertz frequency into highly focused spot or so-called common focus, and the desired figure of the "umber one", are designed and fabricated. For testing the element, the LASER SIEIR 50 of Coherent Company is used to generate common Gaussian laser beams (the diameter of the beams is ~10mm), and the PYROCAM THERE of Spiricon Company is also used to display the images acquired. Experimental results show that the elements can be used to form needed light fields and expected images, respectively.

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