Mr. Jim D. Rosenbohm Profile

Jim D. Rosenbohm

Optical Tech.

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 24 March 2006 Paper

EUV optical system for the reticle imaging microscope (RIM)

H. Glatzel, J. Daniel, K. Khajehnouri, U. Mueller, T. Roff, J. Rosenbohm, S. Sporer

Proceedings Volume 6151, 615130 (2006) https://doi.org/10.1117/12.677199

KEYWORDS: Mirrors, Extreme ultraviolet, Imaging systems, Microscopes, Surface finishing, Atomic force microscopy, Reticles, Optical coatings, Wavefronts, Polishing

Read Abstract +

The EUV optical system of the Reticle Imaging Microscope (RIM) for EUV mask inspection consists of a pinched Xeplasma source, a pupil-relayed Koehler-type illumination system and an equal-radii Cassegrain-type microscope with a 10x magnification¹. The 3D surface topologies were characterized over spatial wavelengths ranging from the clear apertures down to a few nanometers by using a portfolio of instruments including contacting profilometry, phase-shifting interferometry at 633 nm at various magnifications and Atomic Force Microscopy. Measured 3D topography maps were Fourier analyzed and Power Spectral Densities (PSDs) are computed over spatial periods ranging from the critical aperture down to a few nm. Integrated RMS surface errors over typically reported spatial period ranges were computed. For a different optical system we improved our polishing process to reduce surface errors for spatial periods below 10 mm. PSDs and integrated RMS surface errors will be shown in comparison with typical RIM surfaces. All surfaces of the RIM optical system were coated with high-reflectivity coatings to maximize optical throughput. A description of the coatings and their performance had been published recently by Michael Kriese et al.² The transmitted wavefront error (TWF) of the imager module was measured in a double pass configuration using a Fizeau-type Interferometer at 633 nm wavelength and a convex retrosphere. The measured TWF will be shown over the entire Numerical Aperture (NA = 0.0625) of the microscope. The integrated RMS of the TWF measured 0.79 nm.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years