Dr. Johannes Plauth Profile

Dr. Johannes Plauth

Field Application Engineer

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Publications (2)

Proceedings Article | 16 March 2009 Paper

High-order distortion effects induced by extreme off-axis illuminations at hyper NA lithography

Pierluigi Rigolli, Gianfranco Capetti, Elio De Chiara, Leonardo Amato, Umberto Iessi, Paolo Canestrari, Christine Llorens, Sanne Smit, Lionel Brige, Johannes Plauth

Proceedings Volume 7274, 72742T (2009) https://doi.org/10.1117/12.814148

KEYWORDS: Overlay metrology, Lithographic illumination, Distortion, Lithography, Semiconducting wafers, Device simulation, Reticles, Yield improvement, Scanners, Wavefronts

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Proceedings Article | 2 June 2000 Paper

Overlay performance on tungsten CMP layers using the ATHENA alignment system

Giovanni Rivera, Laura Rozzoni, Elisabetta Castellana, Guido Miraglia, Pui Lam, Johannes Plauth, Allan Dunbar, Merritt Phillips

Proceedings Volume 3998, (2000) https://doi.org/10.1117/12.386498

KEYWORDS: Metals, Optical alignment, Semiconducting wafers, Overlay metrology, Avalanche photodetectors, Aluminum, Chemical mechanical planarization, Oxides, Tungsten, Data transmission

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