Unspecified Johnny Herrera Profile

Johnny Herrera

at Siemens EDA

SPIE Involvement:

Author

Publications (1)

Proceedings Article | 13 June 2022 Presentation

Germain Fenger, Youngchang Kim, Ignat Moskalenko, Johnny Herrera, Alexander Drutsa

Proceedings Volume PC12056, PC1205605 (2022) https://doi.org/10.1117/12.2614280

KEYWORDS: Etching, Reactive ion etching, Optical proximity correction, Neural networks, Machine learning, Ions

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Keywords/Phrases