Dr. Juan C. Ivaldi
VP R&D at Nikon Research Corp of America
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 28 May 2004 Paper
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.537447
KEYWORDS: Reticles, Critical dimension metrology, Photomasks, Binary data, Lithography, Scanners, Scanning electron microscopy, Phase shifts, Semiconducting wafers, Optical lithography

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