Mr. Jyun-Ming Chen Profile

Jyun-Ming Chen

at ASML Belgium BV

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Publications (2)

Proceedings Article | 10 April 2024 Presentation + Paper

EUV OPC modeling of dry photoresist system for pitch 32nm BEOL

Jyun-Ming Chen, David Rio, Maxence Delorme, Cyrus Tabery, Christoph Hennerkes, Chris Spence, Benjamin Kam, Mohand Brouri, Nader Shamma

Proceedings Volume 12953, 129530C (2024) https://doi.org/10.1117/12.3010402

KEYWORDS: Photoresist materials, Optical proximity correction, Calibration, Semiconducting wafers, Shrinkage, Printing, Scanning electron microscopy, Photoresist developing, Metals, Critical dimension metrology

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Proceedings Article | 1 December 2022 Poster + Paper

Aerial image metrology (AIMS) based mask-model accuracy improvement for computational lithography

N. Pandey, S. Hunsche, A. Lyons, J. Chen, R. la Greca, R. Capelli, G. Kersteen

Proceedings Volume 12293, 122930R (2022) https://doi.org/10.1117/12.2641724

KEYWORDS: Photomasks, Calibration, 3D modeling, Data modeling, Metrology, Optical proximity correction, SRAF, Semiconducting wafers, Reticles, Critical dimension metrology

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