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Kuoyao Chou
SMTS
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Publications (1)
Proceedings Article | 8 March 2016 Paper
Metrology target design (MTD) solution for diagonally orientated DRAM layer
Myungjun Lee, Mark Smith, Michael Adel, Chia-Hung Chen, Chin-Chang Huang, Hao-Lun Huang, Hsueh-Jen Tsai, I-Lin Wang, Jen-Chou Huang, Jo-Lan Chin, Kuo-Yao Chou, Yuan-Ku Lan, Hsien-Yen Lung, Jui-Chin Yang, Tal Itzkovich, Healthy Huang, Yaniv Abramovitz, Jinyan Song, Chen Dror, Harvey Cheng, Ady Levy
Proceedings Volume 9778, 97782R (2016) https://doi.org/10.1117/12.2218659
KEYWORDS: Personal protective equipment, Metrology, Lithography, Overlay metrology, Photomasks, Scanners, Lithographic illumination, SRAF, Neodymium, Optical proximity correction
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