The rapid development of micro- and nanofabrication technologies during the recent decades allows for constant improvement of electronic devices. Furthermore, it is now possible to couple these devices to mechanical, optical, quantum, bio, and their systems. As these technologies find new applications, the requirements for the materials are becoming higher. Some of these applications (plasmonics, for instance) benefit from materials of high purity and free of defects. Zone-melting is a well-known and refined process for improving the purity and crystallinity of macro objects but on the microscopic scale it has not been studied as thoroughly.
In this work we explore the idea of implementing zone melting on a micrometer scale by localized heating induced by focused electron beam irradiation. The model structure is a thin metallic stripe on a quartz substrate. The peak temperature and the temperature profile around the heated zone are evaluated by finite element simulations. The results show that the molten zone is narrow but when it is at the end of the stripe, the peak temperature increases. This effect was compensated by introducing heatsinks with optimized size. Proof- of-concept experiments were performed on the optimized structures in a scanning electron microscope (SEM) modified for operation with a higher beam current.
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