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Kaushalia Dubey
Application Engineer at Canon Singapore Pte Ltd
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Publications (1)
Proceedings Article | 26 March 2007 Paper
A study of overlay mark robustness and enhanced alignment techniques for alignment improvement on metal layers of sub-100-nm technology
Kaushalia Dubey, Toru Nakamura, Hiroshi Tanaka, Nozomu Hayashi, Shinichi Egashira, Kazuhiko Mishima, Tomohiro Mase, Tamio Takeuchi, Akihiko Honda, Takatoshi Kakizaki
Proceedings Volume 6520, 652033 (2007) https://doi.org/10.1117/12.711324
KEYWORDS: Optical alignment, Semiconducting wafers, Chemical mechanical planarization, Coating, Metals, Overlay metrology, Reflectivity, Scanners, Oxides, Light sources
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