Mr. Kazuhiro Takahata Profile

Kazuhiro Takahata

at Toshiba Corp

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Author

Publications (9)

Proceedings Article | 5 April 2012 Paper

Novel prediction methodology for etched hole patterning failure

Seiro Miyoshi, Hideaki Abe, Kazuhiro Takahata, Tomoko Ojima, Masanari Kajiwara, Shoji Mimotogi, Kohji Hashimoto

Proceedings Volume 8324, 83241J (2012) https://doi.org/10.1117/12.916029

KEYWORDS: Optical lithography, Critical dimension metrology, Failure analysis, Lithography, Finite element methods, Process control, Photoresist processing, Reactive ion etching, Data modeling, Optimization (mathematics)

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Proceedings Article | 5 April 2011 Paper

Hotspot detection using image pattern recognition based on higher-order local auto-correlation

Shimon Maeda, Tetsuaki Matsunawa, Ryuji Ogawa, Hirotaka Ichikawa, Kazuhiro Takahata, Masahiro Miyairi, Toshiya Kotani, Shigeki Nojima, Satoshi Tanaka, Kei Nakagawa, Tamaki Saito, Shoji Mimotogi, Soichi Inoue, Hirokazu Nosato, Hidenori Sakanashi, Takumi Kobayashi, Masahiro Murakawa, Tetsuya Higuchi, Eiichi Takahashi, Nobuyuki Otsu

Proceedings Volume 7974, 79740X (2011) https://doi.org/10.1117/12.881193

KEYWORDS: Lithography, Pattern recognition, Computer aided design, Feature extraction, Intelligence systems, Silicon, Photomasks, Image processing, Visualization, Graphic design

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Proceedings Article | 1 April 2009 Paper

Resist process control for 32-nm logic node and beyond with NA > 1.30 immersion exposure tool

Seiji Nagahara, Kazuhiro Takahata, Seiji Nakagawa, Takashi Murakami, Kazuhiro Takeda, Shinpei Nakamura, Makoto Ueki, Masaki Satake, Tatsuhiko Ema, Hiroharu Fujise, Hiroki Yonemitsu, Yuriko Seino, Shinichiro Nakagawa, Masafumi Asano, Yosuke Kitamura, Takayuki Uchiyama, Shoji Mimotogi, Makoto Tominaga

Proceedings Volume 7273, 72733A (2009) https://doi.org/10.1117/12.813498

KEYWORDS: Resolution enhancement technologies, Logic, Optical lithography, Line width roughness, Photoresist processing, Lithography, Photomasks, Copper, Diffusion, Logic devices

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Proceedings Article | 16 March 2009 Paper

Feasibility of ultra-low k1 lithography for 28nm CMOS node

Shoji Mimotogi, Kazuhiro Takahata, Takashi Murakami, Seiji Nagahara, Kazuhiro Takeda, Masaki Satake, Yosuke Kitamura, Tomoko Ojima, Hiroharu Fujise, Yuriko Seino, Tatsuhiko Ema, Hiroki Yonemitsu, Manabu Takakuwa, Shinichiro Nakagawa, Takuya Kono, Masafumi Asano, Suigen Kyoh, Hideaki Harakawa, Akiko Nomachi, Tatsuya Ishida, Shunsuke Hasegawa, Katsura Miyashita, Makoto Tominaga, Soichi Inoue

Proceedings Volume 7274, 72741F (2009) https://doi.org/10.1117/12.814040

KEYWORDS: Lithography, Photomasks, Lithographic illumination, Binary data, Scanners, SRAF, Logic devices, Optical lithography, Metals, Semiconductors

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Proceedings Article | 4 December 2008 Paper

Patterning performance of hyper NA immersion lithography for 32nm node logic process

Kazuhiro Takahata, Masanari Kajiwara, Yosuke Kitamura, Tomoko Ojima, Masaki Satake, Hiroharu Fujise, Yuriko Seino, Tatsuhiko Ema, Manabu Takakuwa, Shinichiro Nakagawa, Takuya Kono, Masafumi Asano, Suigen Kyo, Akiko Nomachi, Hideaki Harakawa, Tatsuya Ishida, Shunsuke Hasegawa, Katsura Miyashita, Takashi Murakami, Seiji Nagahara, Kazuhiro Takeda, Shoji Mimotogi, Soichi Inoue

Proceedings Volume 7140, 714017 (2008) https://doi.org/10.1117/12.804739

KEYWORDS: Resolution enhancement technologies, Optical lithography, Logic, Lithography, SRAF, Metals, Immersion lithography, Semiconductors, Optical proximity correction, Logic devices

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Proceedings Article | 19 May 2008 Paper

Scanner fleet management utilizing programmed hotspot patterns

Kenji Yoshida, Soichi Inoue, Koji Hashimoto, Satoshi Tanaka, Masaki Satake, Takashi Obara, Kazuhiro Takahata, Eiji Yamanaka, Mitsuyo Kariya, Hiroyuki Morinaga, Shoji Mimotogi

Proceedings Volume 7028, 70280W (2008) https://doi.org/10.1117/12.793038

KEYWORDS: Scanners, Photomasks, Semiconducting wafers, Inspection, Lithography, Data acquisition, Infrared imaging, Reliability, Lithographic illumination, Optical proximity correction

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Proceedings Article | 19 May 2008 Paper

Impact of patterning strategy on mask fabrication beyond 32nm

Shoji Mimotogi, Tomotaka Higaki, Hideki Kanai, Satoshi Tanaka, Masaki Satake, Yosuke Kitamura, Katsuyoshi Kodera, Kazutaka Ishigo, Takuya Kono, Masafumi Asano, Kazuhiro Takahata, Soichi Inoue

Proceedings Volume 7028, 702814 (2008) https://doi.org/10.1117/12.793045

KEYWORDS: Optical lithography, Photomasks, Double patterning technology, Critical dimension metrology, Lithography, Mask making, Logic devices, Optical alignment, Reactive ion etching, Semiconducting wafers

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Proceedings Article | 1 April 2008 Paper

Patterning strategy and performance of 1.3NA tool for 32nm node lithography

Shoji Mimotogi, Masaki Satake, Yosuke Kitamura, Kazuhiro Takahata, Katsuyoshi Kodera, Hiroharu Fujise, Tatsuhiko Ema, Koutaro Sho, Kazutaka Ishigo, Takuya Kono, Masafumi Asano, Kenji Yoshida, Hideki Kanai, Suigen Kyoh, Hideaki Harakawa, Akiko Nomachi, Tatsuya Ishida, Katsura Miyashita, Soichi Inoue

Proceedings Volume 6924, 69240M (2008) https://doi.org/10.1117/12.772201

KEYWORDS: Lithography, Optical lithography, Scanners, SRAF, Semiconducting wafers, Lithographic illumination, Metals, Photomasks, Semiconductors, Logic devices

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Proceedings Article | 12 May 2005 Paper

Optical lithography technologies for 45-nm node CMOS

Shoji Mimotogi, Fumikatsu Uesawa, Suigen Kyoh, Hiroharu Fujise, Eishi Shiobara, Mikio Katsumata, Hiroki Hane, Tomohiro Sugiyama, Koutaro Sho, Maki Miyazaki, Kazuhiro Takahata, Hideki Kanai, Kazuya Sato, Kohji Hashimoto

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600948

KEYWORDS: Lithography, Photomasks, Critical dimension metrology, Lens design, Photoresist processing, CMOS technology, Optical lithography, Metals, Logic, Semiconductors

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Showing 5 of 9 publications

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