Two routes have been pursued toward the fabrication of photoresists for next-generation microlithography, using condensed carbon dioxide as the processing solvent. Addition polymers containing a norbornyl backbone were synthesized to include fluorinated moieties and chemical amplification switching groups. Other polymers, synthesized free radically in condensed CO2, include partially fluorinated backbones. These materials have been characterized and their lithographic properties evaluated. Solubility differences between exposed and non-exposed resist have been observed in these novel systems, which should provide the necessary contrast for high-resolution imaging.
Norbornene-based monomers were synthesized to include fluorinated moieties and/or chemical amplification switching groups. Fluorinated homopolymers to be used as the basis of resist materials were synthesized from these monomers by addition polymerization using allylpalladium chloride dimmer. Monomers and polymers have been identified and partially characterized for important lithographic properties. A monomer containing a silsesquioxane group has been incorporated into this platform to enhance etch resistance. A monomer containing an acid-cleavable group has also been synthesized and will be incorporated into this platform.
Norbornene-based monomers were synthesized to include fluorinated moieties and/or chemical amplification switching groups. Polymers to be used as potential resist materials were synthesized from these monomers by addition polymerization using allylpalladium chloride dimmer. Monomers and polymers have been identified and partially characterized for important lithographic properties.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.