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Matthew R. Pekny
at Intel Corp
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Author
Publications (1)
Proceedings Article | 28 August 2003 Paper
SMIF capability at Intel Mask Operation improves yield
Thuc Dam, Matt Pekny, Jim Millino, Gibson Luu, Nitesh Melwani, Aparna Venkatramani, Malahat Tavassoli
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504267
KEYWORDS: Reticles, Inspection, Coating, Particles, Yield improvement, Thin film coatings, Photoresist processing, Particle contamination, Etching, Robotics
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