Dr. Nicolas Spaziani Profile

Dr. Nicolas Spaziani

Ph. D. Student at STMicroelectronics

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Nicolas Spaziani was born in France in 1980. He received the engineer degree in physics engineering for micro and nano electronics materials in 2008 from Sciences University Montpellier, France. Since 2008, he has been pursuing the Ph.D. degree at the Grenoble Institute of Technology, in collaboration with Technologic of Microelectronics Laboratory (L.T.M), STMicroelectronics and C.E.A/L.E.T.I.
His current research interests are the Focus Control in micro-Lithography.

Publications (3)

Proceedings Article | 10 April 2013 Paper

Scatterometry-based dose and focus decorrelation: applications to 28nm contact holes patterning intrafield focus investigations

B. Orlando, N. Spaziani, N. Socquet, R. Bouyssou, M. Gatefait, P.J. Goirand

Proceedings Volume 8681, 868118 (2013) https://doi.org/10.1117/12.2011122

KEYWORDS: 3D modeling, Scatterometry, Optical lithography, Critical dimension metrology, Scatter measurement, Lithography, Semiconducting wafers, Process control, Silicon, Silicon carbide

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Proceedings Article | 5 April 2012 Paper

Lithography process control using in-line metrology

Nicolas Spaziani, René-Louis Inglebert, Jean Massin

Proceedings Volume 8324, 83241L (2012) https://doi.org/10.1117/12.916372

KEYWORDS: Critical dimension metrology, Lithography, Photoresist materials, Metrology, Semiconducting wafers, Reticles, Photomasks, Control systems, Scatterometry, Quartz

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Proceedings Article | 23 March 2011 Paper

Lithography process control using focus and dose optimisation technique

Nicolas Spaziani, René-Louis Inglebert, Jean Massin

Proceedings Volume 7973, 79732Z (2011) https://doi.org/10.1117/12.879074

KEYWORDS: Critical dimension metrology, Photoresist materials, Scatterometry, Semiconducting wafers, Scatter measurement, Control systems, Lithography, Deconvolution, Process control, Finite element methods

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