Mr. Nobuhiro Komine Profile

Nobuhiro Komine

at Toshiba Materials Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 10 April 2013 Paper

Improvement of focus accuracy on processed wafer

Satomi Higashibata, Nobuhiro Komine, Kazuya Fukuhara, Takashi Koike, Yoshimitsu Kato, Kohji Hashimoto

Proceedings Volume 8681, 868138 (2013) https://doi.org/10.1117/12.2011374

KEYWORDS: Semiconducting wafers, Atrial fibrillation, Sensors, Polysomnography, Phase shifts, Reticles, Scanning electron microscopy, Semiconductors, Optical lithography, Photomasks

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Proceedings Article | 2 April 2010 Paper

Overlay sampling optimization by operating characteristic curves empirically estimated

Kentaro Kasa, Masafumi Asano, Takahiro Ikeda, Manabu Takakuwa, Nobuhiro Komine, Kazutaka Ishigo

Proceedings Volume 7638, 76382G (2010) https://doi.org/10.1117/12.846344

KEYWORDS: Inspection, Semiconducting wafers, Error analysis, Overlay metrology, Visualization, Statistical analysis, Optimization (mathematics), Semiconductors, Lithography, Metrology

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Proceedings Article | 23 March 2009 Paper

Polar Correction: new overlay control method for higher-order intra-field error dependent on the wafer coordinates

Manabu Takakuwa, Keigo Toriumi, Nobuhiro Komine, Kazutaka Ishigo, Takuya Kono, Tetsuro Nakasugi, Tatsuhiko Higashiki

Proceedings Volume 7272, 72720J (2009) https://doi.org/10.1117/12.813490

KEYWORDS: Semiconducting wafers, Overlay metrology, Data corrections, Immersion lithography, Process control, Control systems, Source mask optimization, Distortion, Osmium, Radon

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Proceedings Article | 28 May 2004 Paper

Method of robust pattern design for lens aberration

Nobuhiro Komine, Kenji Konomi, Keita Asanuma, Kazuo Tawarayama, Tatsuhiko Higashiki

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536244

KEYWORDS: Diffraction, SRAF, Lens design, Critical dimension metrology, Monochromatic aberrations, Semiconducting wafers, Semiconductors, Light sources, Scanning electron microscopy, Image acquisition

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Proceedings Article | 29 April 2004 Paper

Mix-and-match overlay method by compensating dynamic scan distortion error

Takuya Kono, Manabu Takakuwa, Keita Asanuma, Nobuhiro Komine, Tatsuhiko Higashiki

Proceedings Volume 5378, (2004) https://doi.org/10.1117/12.535097

KEYWORDS: Distortion, Scanners, Overlay metrology, Data modeling, Control systems, Error analysis, Databases, Semiconducting wafers, Systems modeling, Semiconductors

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