Mr. Ognian N. Dimov Profile

Ognian N. Dimov

Senior Associate Engineer at FUJIFILM Electronic Materials USA Inc

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Author

Publications (6)

Proceedings Article | 24 August 2001 Paper

Lithographic behavior of carboxylate-based dissolution inhibitors and the effect of blending

Francis Houlihan, Zhenglin Yan, Elsa Reichmanis, Gary Dabbagh, Kevin Bolan, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436904

KEYWORDS: Lithography, Polymers, Molecules, Solids, Semiconducting wafers, Image resolution, Silicon films, Prototyping, Chemically amplified resists, Analog electronics

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Proceedings Article | 24 August 2001 Paper

Thermal properties of COMA materials

Ilya Rushkin, Bernard Beauchemin, Ognian Dimov, Thomas Kocab, Arturo Medina, Thomas Sarubbi, Murrae Bowden

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436841

KEYWORDS: Monochromatic aberrations, Polymers, Glasses, Temperature metrology, Polymerization, Semiconducting wafers, Lithography, Solids, Silicon, Bottom antireflective coatings

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Proceedings Article | 24 August 2001 Paper

Base additives for use in a single layer 193-nm resist based upon poly(norbornene/maleic anhydride/acrylic acid/tert-butyl acrylate)

Francis Houlihan, Donna Person, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov, Elsa Reichmanis

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436912

KEYWORDS: Lithography, Hassium, Chemically amplified resists, Polymers, Chromophores, Information operations, Picosecond phenomena, Standards development, Calcium, Nomenclature

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Proceedings Article | 23 June 2000 Paper

Modeling chemically amplified resists for 193-nm lithography

Ebo Croffie, Mosong Cheng, Andrew Neureuther, Francis Houlihan, Raymond Cirelli, James Sweeney, Gary Dabbagh, Pat Watson, Omkaram Nalamasu, Ilya Rushkin, Ognian Dimov, Allen Gabor

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388300

KEYWORDS: Diffusion, Data modeling, FT-IR spectroscopy, Chemically amplified resists, Semiconducting wafers, Absorbance, Photolysis, Polymers, Lithography, Interfaces

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Proceedings Article | 23 June 2000 Paper

Dissolution properties of cycloolefin-maleic-anhydride-based resist resins

Ilya Rushkin, Francis Houlihan, Janet Kometani, Richard Hutton, Omkaram Nalamasu, Elsa Reichmanis, Ognian Dimov, Arturo Medina, Ulrike Varlemann, Allen Gabor, T. Sarrubi, Murrae Bowden

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388305

KEYWORDS: Polymers, Polymerization, Lithography, Molecules, Standards development, Photoresist processing, Dry etching, Resistance, Printing, Modulation

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Proceedings Article | 11 June 1999 Paper

Optimization of 193-nm single-layer resists through statistical design

Allen Gabor, Ognian Dimov, Arturo Medina, Mark Neisser, Sydney Slater, Ruey Wang, Francis Houlihan, Raymond Cirelli, Gary Dabbagh, Richard Hutton, Ilya Rushkin, James Sweeney, Allen Timko, Omkaram Nalamasu, Elsa Reichmanis

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350205

KEYWORDS: Polymers, Lithography, Binary data, Distributed interactive simulations, Etching, Resistance, Photomasks, Diffusion, Silicon, Semiconducting wafers

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Showing 5 of 6 publications

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