Dr. Otman Benali Profile

Dr. Otman Benali

at NANO-UV SAS

SPIE Involvement:

Author

Publications (4)

SPIE Journal Paper | 7 June 2012

High-radiance extreme-ultraviolet light source for actinic inspection and metrology

Peter Choi, Sergey Zakharov, Raul Aliaga-Rossel, Aldrice Bakouboula, Otman Benali, Philippe Bove, Michèle Cau, Grainne Duffy, Osamu Iwase, Keith Powell, Blair Lebert, Ouassima Sarroukh, Clement Zaepffel, Vasily Zakharov

JM3, Vol. 11, Issue 02, 021107, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021107

KEYWORDS: Extreme ultraviolet, Plasma, Inspection, Metrology, Xenon, Multiplexing, Light sources, Ions, Tin, Capillaries

Read Abstract +

Proceedings Article | 8 April 2011 Paper

High-brightness EUV light source for HVM

Peter Choi, Sergey Zakharov, Raul Aliaga-Rossel, Aldrice Bakouboula, Jeremy Bastide, Otman Benali, Philippe Bove, Michèle Cau, Grainne Duffy, Carlo Fanara, Wafa Kezzar, Blair Lebert, Keith Powell, Ouassima Sarroukh, Luc Tantart, Clement Zaepffel, Vasily Zakharov

Proceedings Volume 7969, 796935 (2011) https://doi.org/10.1117/12.892554

KEYWORDS: Extreme ultraviolet, Plasma, Photodiodes, Data modeling, Tin, Multiplexing, Extreme ultraviolet lithography, Light sources, Photomasks, Capillaries

Read Abstract +

Proceedings Article | 23 March 2010 Paper

High brightness EUV light sources for actinic metrology

Peter Choi, Sergey Zakharov, Raul Aliaga-Rossel, Aldrice Bakouboula, Jeremy Bastide, Otman Benali, Philippe Bove, Michèle Cau, Grainne Duffy, Wafa Kezzar, Blair Lebert, Keith Powell, Ouassima Sarroukh, Luc Tantart, Edmund Wyndham, Clement Zaepffel, Vasily Zakharov

Proceedings Volume 7636, 76363B (2010) https://doi.org/10.1117/12.848477

KEYWORDS: Extreme ultraviolet, Plasma, Multiplexing, Metrology, Photomasks, Inspection, Capillaries, Light sources, EUV optics, Photodiodes

Read Abstract +

Proceedings Article | 18 March 2009 Paper

High-performance next-generation EUV lithography light source

Peter Choi, Sergey Zakharov, Raul Aliaga-Rossel, Otman Benali, Grainne Duffy, Ouassima Sarroukh, Edmund Wyndham, Vasily Zakharov

Proceedings Volume 7271, 72712X (2009) https://doi.org/10.1117/12.814168

KEYWORDS: Extreme ultraviolet, Plasma, Multiplexing, Xenon, Ions, Extreme ultraviolet lithography, Light sources, Electrons, Metrology, Photomasks

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years