Developing approaches to power efficient and high-throughput computing is critical for meeting ever-growing computational requirements. There is significant interest in using optics to perform computational tasks such as performing image processing tasks in analog, eliminating the need for computational resources. In this work, we demonstrate inverse-designed meta-optics capable of isotropic 2D edge-detection with large numerical apertures. To highlight the versatility afforded by the optimization-based approach, we design a multifunctional device that performs a variety of processing tasks based on polarization, wavelength, and diffraction order. These devices can be used in novel computer vision and computational imaging applications.
We present a visible light interference lithography technique that utilizes a 2x2 cm metasurface mask to enable fabrication of 8x8 cm continuous and homogenous nano-architected materials. Patterns are resolved both in commercial 20-60 um films of SU-8 and >20 um films of custom glycidyl methacrylate-derived negative-tone photoresists. The combination of our metasurface-enabled large-scale 3D patterning technique with customizable photoresist chemistry provides a new pathway for scalable production of architected materials with nanometer feature resolution and advanced functional properties. Impact experiments using Laser-Induced Particle Impact Testing (LIPIT) were conducted to probe mechanical response and material homogeneity.
Nano-architected materials have the potential to be adopted in several areas including photonic devices and structural materials. We present a 3D interference lithography technique with dielectric metasurfaces at visible wavelengths that allows patterning of thick epoxide films over areas on the order of 10 cm^2 with 100 nm resolution. By leveraging the ability of the metasurface to control the amplitude and phase of a wavefront, complex near-field 3D interference patterns can be designed. Pyrolysis of 3D patterned SU-8 produces a carbon-based material with sub-100 nm features and enhanced mechanical properties.
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