Fast miniature plasma focus (FMPF-3), a low energy (235 J) device, is an attractive option for being a
potential source for soft X-ray (SXR) (0.9 – 1.6 keV) lithography due to its smaller X-ray generation spot
size and the capability of being a high repetition source. As a continuation of our work on the enhancement
of SXR emission from this device, in present investigation the insulator sleeve length is optimized for
efficient SXR emission. It plays a major role in the current sheath formation, which is determinant of the
efficient compression and the consequent radiation emission. The influence of the presence or absence of
cathode rods on the SXR emission is also investigated. It is one least explored parameter although it plays a
major role in the determination of plasma sheath curvature which in turn influences the dynamic plasma
inductance and the magnetic flux associated with moving current sheath. Another major highlight of this
study is the time resolved laser shadowgraphy of the plasma sheath dynamics to understand the influence of
the variation of these parameters on it. Through optimization of the insulator sleeve length, the highest ever
obtained SXR yield of 1.8 J/shot was achieved for this device.
Conference Committee Involvement (7)
Advances in Metrology for X-Ray and EUV Optics IX
24 August 2020 | Online Only, California, United States
Advances in Metrology for X-Ray and EUV Optics VIII
11 August 2019 | San Diego, California, United States
Advances in Metrology for X-Ray and EUV Optics VII
6 August 2017 | San Diego, California, United States
Advances in Metrology for X-Ray and EUV Optics VI
29 August 2016 | San Diego, California, United States
Advances in Metrology for X-Ray and EUV Optics V
18 August 2014 | San Diego, California, United States
Advances in Metrology for X-Ray and EUV Optics IV
12 August 2012 | San Diego, California, United States
Advances in Metrology for X-Ray and EUV Optics III
1 August 2010 | San Diego, California, United States
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