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Rich Meinecke
Sales Project Manager at HORIBA STEC Inc
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Publications (1)
Proceedings Article | 1 February 1992 Paper
Damage and RTA kinetics in Ar+ and Si+ ion-implanted CZ silicon characterized by thermal wave modulated optical reflectance
Sookap Hahn, Walter Smith, Tohru Hara, H. Hagiwara, H. Suzuki, Yeong-Keun Kwon, Kwang-Il Kim, Y.-H. Bae, W. Chung, Charles Yarling, L. Larson, Richard Meinecke
Proceedings Volume 1595, (1992) https://doi.org/10.1117/12.56670
KEYWORDS: Ions, Silicon, Semiconducting wafers, Modulation, Reflectivity, Ion implantation, Annealing, Thermography, Transmission electron microscopy, Imaging systems
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