Rick L. Roehl
Program Manager at Lockheed Martin Santa Barbara Focalplane
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 14 May 2007 Paper
L. Allen, K. Blanchet, C. Jones, V. Difilippo, E. Roehl, C. Santeufemio, K. Jones, B. Zide, G. Dallas, S. Vangala, W. Goodhue, J. Barton
Proceedings Volume 6542, 65423P (2007) https://doi.org/10.1117/12.718185
KEYWORDS: Chemical mechanical planarization, Surface finishing, Semiconducting wafers, Oxides, Etching, Manufacturing, Staring arrays, Ion beams, Mid-IR, Atomic force microscopy

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