The emphasis of this course is on materials selection, basic design and development methods. Using a progressive series of case studies, image forming and beam shaping systems at wavelengths <404.7 nm (h-line) are discussed. These include wide-angle cameral lenses, microscope objectives, and optics for laser ablation. Anamorphic systems for excimer beam shaping and homgenization are covered. The course ends with high-NA catadioptic and all-reflective image systems for applications in the DUV and EUV, respectively.