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Ryo Hirose
at Osaka Univ
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Publications (1)
Proceedings Article | 26 March 2008 Paper
Dependence of acid generation efficiency on acid molecular structure and concentration of acid generator in chemically amplified EUV resist
Ryo Hirose, Takahiro Kozawa, Seiichi Tagawa, Toshiyuki Kai, Tsutomu Shimokawa
Proceedings Volume 6923, 69232A (2008) https://doi.org/10.1117/12.772569
KEYWORDS: Extreme ultraviolet, Electrons, Extreme ultraviolet lithography, Absorption, Line edge roughness, Molecules, Ions, Optical lithography, Chemically amplified resists, Ionization
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