Prof. Sang-Kon Kim
Associate Professor at Hongik Univ
SPIE Involvement:
Author
Area of Expertise:
lithography process , simulation , lithography CAD , MEMS , bioMEMS
Websites:
Profile Summary

Kim, Ph.D. has been an associate professor at the Faculty of Liberal Arts, Seoul campus, in Hongik univeristy, since 2020.

Kim, Ph.D. was a visiting professor at the department of applied science, Seoul campus, Hongik university during 2012-2019. He was a research professor and post-doc at the HRDPI of Bionano Fusion Technology, ERICA campus, in Hanyang Univeristy during 2007-2011. He was a visting professor at the school of Information, Communications and Electronics Engineering in Catholic University of Korea for two years, 2005-2006. Kim was a team leader for Hanwha Corporation / Telecommunication company. During his two years at Hanwha Corporation / Telecommunication company, Kim spent time doing the fabrication and packaging of the 155 Mbps optical transmitter / receiver modules. During three years, April 1990 ~ January 1993, Kim spent time doing the chip testing software such as the fault simulator at the ASIC division of Samsung Electronics in Korea.

Kim received a bachelor degree in Physics from Hanyang University, Seoul, Korea, a master degree from Northeastern University, Boston, MA, United States, and a Ph.D. in Physics from Hanyang University, Korea. Kim has modeled lithography processes for computer simulation and has compared those results to the experimental results. He has the honor of a Best Academic Poster Award at the SPIE’s Microlithography Symposium Conference in 2006 and a Best Paper Prize at the 7th International Nanotech Symposium & Exhibition in Korea (NANO KOREA) in 2009.

Kim’s interesting area is lithography process, simulation, lithography CAD, MEMS, and bioMEMS.
Publications (19)

Proceedings Article | 28 September 2021 Poster
Proceedings Volume 11854, 118541G (2021) https://doi.org/10.1117/12.2600944
KEYWORDS: Photons, Stochastic processes, Lithography, Extreme ultraviolet, Ultraviolet radiation, Extreme ultraviolet lithography, Quenching (fluorescence), Polymers, Multiphoton processes, Monte Carlo methods

Proceedings Article | 21 February 2021 Poster + Presentation + Paper
Proceedings Volume 11609, 116091I (2021) https://doi.org/10.1117/12.2583674
KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Scattering, Reflectivity, Multilayers, Inspection, Absorption

Proceedings Article | 20 August 2020 Presentation + Paper
Proceedings Volume 11462, 114622Y (2020) https://doi.org/10.1117/12.2570752
KEYWORDS: Plasmonics, Surface plasmons, Lithography, Optical lithography, Scanning probe lithography, Metamaterials, Finite-difference time-domain method, Photoresist materials, Near field scanning optical microscopy

Proceedings Article | 26 March 2019 Paper
Proceedings Volume 10957, 109571N (2019) https://doi.org/10.1117/12.2515224
KEYWORDS: Line edge roughness, Fin field effect transistors, Extreme ultraviolet lithography, Oxides, Stochastic processes, Critical dimension metrology, Lithography, Semiconductors, Doping, Bismuth

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 79732X (2011) https://doi.org/10.1117/12.879562
KEYWORDS: Diffraction, Lithography, Diffraction gratings, Quantum computing, Quantum communications, Absorption, Optical lithography, Photomasks, Entangled states, Quantum information

Showing 5 of 19 publications
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top